In the publication (Nanoscale Research Letters 2011, 6:458), Shin et al introduced a nano-imprinting process, including fabrication of a flexible imprinting mold and using this mold, the micro- to nano-sized patterns of the original master Si template were replicated on a flat Si substrate and curved aryl substrate.
Continue reading “Nano-imprinting”Author: catinbarn
Laser ablation mechanisms
There are two mechanisms to explain laser ablation process: Classical beam-matter interaction mechanism for micro- and nano-second pulse laser ablation and two temperature mechanism for pico-and femto-second pulse laser ablation.
Continue reading “Laser ablation mechanisms”Laser ablation
In the publication of Brian Q, et al., Optics and Laser Technology (2012), the authors reported a laser ablation method to pattern ITO film on a glass substate for the solar cell fabrication.
Continue reading “Laser ablation”Al Vs Cu
Traditionally, IC interconnects formed from Al; however due to scaling and performances needs, Copper is gradually replacing Aluminum.
Continue reading “Al Vs Cu”Deep reactive ion etching (DRIE)
Deep receive ion etching (DRIE) include two process: Bosch process and Cryogenic process (Reference 1).
Continue reading “Deep reactive ion etching (DRIE)”Dry etching
It is difficult for wet etching to achieve good anisotropy in fabrication; therefore dry etching is adopted to solve this problem.
Continue reading “Dry etching”Wet etching
Etching is an important step in the fabrication of semiconductor devices and other similar process. It includes wet etching, a solution based method, and drying etching, based on vacuum process typically.
Continue reading “Wet etching”Photo elastic modulator
photo elastic modulator
Photo elastic modulator (PEM) is one the critical components in a phase modulated ellipsometer, which modulates phase and amplitude changes in detected signal, based on that Psi and Delta will be measured and n, k, d, and others accordingly in principle.
Continue reading “Photo elastic modulator”Ellipsometry
Ellipsometry is a powerful tool in thin film field to characterize film properties, e.g. refractive index (n), extinction coefficiency (k), surface roughness, crystallinity, etc.
Continue reading “Ellipsometry”Transmittance/Haze/Clarity measurement-ASTM D 1003
As a simplified view, light is incident upon a sample, three processes occur: transmission, absorption, and reflection, as schematically shown in the follow figure, including retroflection, diffuse reflection, specular reflection, diffuse transmission, and specular transmission.
Continue reading “Transmittance/Haze/Clarity measurement-ASTM D 1003”