Organic Electronics – Paul Wu's Blog

Colorless PI

Polyimide (PI) film has been broadly used in industries due to its high mechanical strength, thermal stability, low coefficient of expansion (CTE), etc.

Aggregation-induced emission (AIE)

Contrary to the well-known aggregation caused quenching of chromophore, there are certain materials show no or weak emission at solution, but strong emission when aggregated, e.g. in solid films. The phenomenon is called aggregation induced emission (AIE).

Some notes about ITO

Indium tin oxide (ITO) is tin-doped In₂O₃, a n-type wide-bandgap heavily doped (or degenerate) semiconductor with certain metal-like properties. Therefore it is a transparent conductor, and broadly used in variety of industries.

Color and measurement (ASTM E1164)

The color of an object is determined by illuminant (light source), object, and observer (detector, eyes).

Laser ablation mechanisms

There are two mechanisms to explain laser ablation process: Classical beam-matter interaction mechanism for micro- and nano-second pulse laser ablation and two temperature mechanism for pico-and femto-second pulse laser ablation.

Laser ablation

In the publication of Brian Q, et al., Optics and Laser Technology (2012), the authors reported a laser ablation method to pattern ITO film on a glass substate for the solar cell fabrication.

Deep reactive ion etching (DRIE)

Deep receive ion etching (DRIE) include two process: Bosch process and Cryogenic process (Reference 1).

Dry etching

It is difficult for wet etching to achieve good anisotropy in fabrication; therefore dry etching is adopted to solve this problem.

Wet etching

Etching is an important step in the fabrication of semiconductor devices and other similar process. It includes wet etching, a solution based method, and drying etching, based on vacuum process typically.

Major coating method and thickness control

The following are simple introduction of major coating methods and factors affecting coating process and coating thickness.